charging on the substrate surface 電荷蓄積

during plasma etching including negative species

• PIC/MC simulation of electronegative discharge

Jpn. J. Appl. Phys. Vol.39 (2000) 2804-2808 Kazuki Denpoh and Kenichi Nanbu

• In rf He plasma by means of a self-consistent kinetic model, the electron temperature is abnormally low for pressures less than 100 mTorr.

Phys. Rev. Lett. 63, 2361-2364 (1989) T. J. Sommerer, W. N. G. Hitchon, and J. E. Lawler

• Godyak and Piejak observed an abrupt increase in electron density and decrease in electron temperature with decreasing gas pressure in rf Ar discharge.

Phys. Rev. Lett. 65, 996–999 (1990) V. A. Godyak and R. B. Piejak

電荷蓄積に関する最も代表的な現象(Ono's comment, Dec2004)：

• notching: Ogino, Nobuo Fujiwara, 1997(JJAP)
• electron shading: Koichi Hashimoto, 1994(JJAP)

Papers concerned with PIC/MC simulation

• [38] M. Surendra and D. B. Graves, “Particle simulations of radiofrequency glow-discharges,” IEEE. Trans. Plasma Sci., vol. 19, pp. 144–157, Apr. 1991. (cited from Yagisawa, 2004)