Mesoscopic modeling

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Surface smoothing by energetic cluster impact
Oliver Rattunde
Results for both surface roughness and power spectrum can be quantitatively explained by a recently developed mesoscopic model for the ECI (energetic cluster impact deposition) process employing a stochastic differential equation.
Journal of Applied Physics -- October 1, 2001 -- Volume 90, Issue 7, pp. 3226-3231

Continuum model of thin film deposition incorporating finite atomic length scales
Peter L. O'Sullivan
We have elucidated some of the atomistic effects by comparing: (i) numerical simulations of thin film deposition using the continuum model, (ii) atomistic (Monte Carlo) models, and (iii) experiments on the sputter deposition of Ta onto a substrate containing etched vias.
Journal of Applied Physics -- October 1, 2002 -- Volume 92, Issue 7, pp. 3487-3494