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We found that the specific heat of sample is independent of temperature within the range of the present measurement: 科学英語論文のすべて p-56

http://content.aip.org/JAPIAU/v65/i1/158_1.html Journal of Applied Physics Vol 65(1) pp. 158-163. January 1, 1989 On the surfaces after Ar-ion-assisted Cl2 etching, peaks appear at about 6-9eV, with higher intensity than those on Fig.2(a).…

Ref: http://d.hatena.ne.jp/Yugo/20040917 crest bottom に入射粒子がreflectionを起こして集中する→crest が大きくなるetching profile simulationで現れるmorphological instabilityを抑制するために、'super sampling' like な手法を応用できないか？ も…