plasma-surface interactions

search result by "surface oxidation" and "etching"
http://www.ireap.umd.edu/ppm/Papers/psst00193.pdf
http://www.ireap.umd.edu/ppm/publications.htm
Study of plasma-surface interactions: chemical dry etching and high-density plasma etching
At high percentages of O2 the etch rate decreases due to surface oxidation of silicon [2].

→ Etch rate of Si and SiO2 for CF4/O2 O2 persentage (Fig)