Differential Surface Charging

of the Dielectric During Plasma Etching and Surface Charge Leakage Kinetic
M.K. Abatchev, B.J. Howard, D.S. Becker, R.L. Stocks, and J. Chapman (Micron Technology, Inc.)
http://www.electrochem.org/meetings/past/201/abstracts/symposia/pij1.htm

ここでの"Differential"は、macroscopicな電荷蓄積ではなく、微細構造内にミクロな分布が現れるということ。↓も参照。
http://www.uwo.ca/ssw/xps_grad_course.pdf